Discipline: Chemistry and Chemical Sciences
Subcategory: Chemistry (not Biochemistry)
DaShan Brodus - Paine College
Co-Author(s): Raul Peters, Xiaoning Zhang, Valerie Hollimon, and DaShan Brodus, Paine College, Augusta, GA
We developed a reversible mean for silicon surface modification by introducing terminal thiol groups directly onto the silicon surface. In our experiment, chlorination of the silicon surface (111) was carried out using the procedure developed by Lewis’s group firstly. The chlorinated substrates were then placed in a dimethylformamide solution containing NaSH for thiolation reaction. After surface thiolation, small molecules, 1H,1H,2H,2H-Perfluorodecanethiol (PFDT), was coated onto the surface via disulfide reactions and then, the removal of the coating was achieved with a mild reducing agent (a reversible approach). After undergoing the reversible cycle three times, the attachment of PFDT was confirmed by X-Ray Photoelectron Spectroscopy (XPS) and contact angle measurement, which approves the reproducibility and repeatability of our method. One objective of this project is to test reaction conditions for silicon substrate thiolation. Optimal reaction conditions should provide us with the highest coverage of thiol.
Funder Acknowledgement(s): National Science Foundation (NSF)
Faculty Advisor: Xiaoning Zhang, XZhang@paine.edu
Role: Contact Angle Meaurement; The Chemical Synthesis studies; Skills in X-ray photoelectron spectroscopy (XPS) data analysis; Prepare the materials for presentation; Growing algae.